Impact of long-period line-edge roughness (LER) on accuracy in CD measurement

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue III, 2005, Pages 1362-1370

  Yamaguchi, Atsuko ^a   Fukuda, Hiroshi ^a   Kawada, Hiroki ^b   Iizumi, Takashi ^b  

^a HITACHI LTD   (Japan)

^b HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

Author keywords

CD SEM; CD variation; Critical dimension; Line edge roughness; Line width roughness; Repeatability

Indexed keywords

BIOMEDICAL ENGINEERING; DIMENSIONAL STABILITY; IMAGING TECHNIQUES; PATTERN RECOGNITION; SCANNING ELECTRON MICROSCOPY;

CD-SEM; CD-VARIATION; CRITICAL DIMENSION (CD); LINE-EDGE ROUGHNESS (LER); LINE-WIDTH ROUGHNESS (LWR); REPEATABILITY;

SURFACE ROUGHNESS;

EID: 24644509737     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.602674     Document Type: Conference Paper

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