Roughness analysis of lithographically produced nanostructures: Off-line measurement and scaling analysis

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 319-325

  Patsis, George P ^a   Constantoudis, Vasilios ^a   Tserepi, Angeliki ^a   Gogolides, Evangelos ^a   Grozev, Grozdan ^b   Hoffmann, Thomas ^b  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; FRACTALS; IMAGE ANALYSIS; MICROELECTRONICS; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY;

QUASIPERIODICITY;

PHOTORESISTS;

EID: 0038359112     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00085-6     Document Type: Conference Paper

References (11)

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