193nm resist roughness characterisation and process propagation investigation using a CD-SEM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 1, 2004, Pages 477-485

  Marschner, Thomas ^a   Lee, Anice ^a   Fuchs, Stefan ^a   Völkel, Lars ^a   Stief, Christian ^b  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b Applied Materials   (Germany)

Author keywords

193nm Resist; CD SEM; Line Edge Roughness; Spatial Frequency

Indexed keywords

193NM RESISTS; CD-SEM; LINE-EDGE ROUGHNESS (LER); SPATIAL FREQUENCY;

ALGORITHMS; ELECTRON BEAMS; ETCHING; FOURIER TRANSFORMS; OPTICAL RESOLVING POWER; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS;

PHOTORESISTS;

EID: 4344596531     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535214     Document Type: Conference Paper

References (8)

1. A.Yamaguchi, R.Tsuchiya, H.Fukuda, O.Komuro, H.Kawada, T.Iizumi, Characterization of Line-Edge Roughness in Resist Patterns and Estimation of ist Effects on Device Performance, SPIE Microlithgraphy Conference 2003, Proc. SPIE 5038, p.689, 2003.
2. A.Yamaguchi, O.Komuro, Characterization of Line Edge Roughness in Resist Patterns by Using Fourier Analysis and Auto-Correlation Function, Jpn. J. Appl. Phys. Vol. 42 p.3763, 2003
3. S.Xiong, J.Bokor, Q.Xiang, P.Fisher, I.Dudley, P.Rao, Study of Gate Line Edge Roughness Effects in 50 nm Bulk MOSFET Devices, SPIE Microlithgraphy Conference 2002, Proc. SPIE 4689, p.733, 2002.
4. G.Eytan, O.Dror, L.Ithier, B.Florin, Z.Lamouchi, and N.Martin, Amplitude and Spatial Frequency of line-edge roughness using CD-SEM, SPIE Microlithgraphy Conference 2002, Proc. SPIE 4689, p.347, 2002.
5. T.Marschner, C.Stief, Precision and Accuracy of CD-SEM Profile Reconstruction for the 110 Technology Node, Proc. IEEE/SEMI Advanced Manufacturing Conference 2003, p.53.
6. I.Laufer, G.Eytan, and O.Dror, Three-Dimensional Aspects of the Shrinking Phenomenon of ArF Resist, SPIE Microlithgraphy Conference 2002, Proc. SPIE 4689, p.841, 2002.
7. E.C.Richter, L.Völkel, T.Marschner, and S.Machill, 193nm Resists: A Status report (Part 2) Future Fab Volume 13, (2002.
8. V. Constantoudis, G. Patsis, E. Gogolides, Photoresist line-edge roughness analysis using scaling concepts, SPIE Microlithgraphy Conference 2003, Proc. SPIE 5038-107, 2003