Line edge roughness of sub-100 nm dense and isolated features: Experimental study

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 3124-3130

  Ma, Yuansheng ^a   Tsvid, G ^a   Cerrina, Franco ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DATA PROCESSING; LITHOGRAPHY; MODULATION; POLYMETHYL METHACRYLATES; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; ULTRAVIOLET RADIATION;

CRITICAL DIMENSION (CD) CONTROL; LINE EDGE ROUGHNESS (LER);

NANOSTRUCTURED MATERIALS;

EID: 0942267513     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1624254     Document Type: Conference Paper

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