Fractal roughness of polymers after lithographic processing

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 44, Issue 1-7, 2005, Pages

  Constantoudis, Vassilios ^a   Gogolides, Evangelos ^a   Patsis, George P ^a   Sarris, Vassilios ^a   Tserepi, Angeliki ^a   Diakoumakos, Constantinos ^a   Valamontes, Evangelos S ^b  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b UNIVERSITY OF WEST ATTICA   (Greece)

Author keywords

Fractal surfaces; Lithography; Monte Carlo simulation; Photoresists; Polymer dissolution; Roughness; Self sffinity; Stochastic simulation

Indexed keywords

COMPUTER SIMULATION; DISSOLUTION; MASKS; MONTE CARLO METHODS; MORPHOLOGY; POLYMERS; RANDOM PROCESSES; SURFACE ROUGHNESS;

FRACTAL SURFACES; POLYMER DISSOLUTION; SELF AFFINITY; STOCHASTIC SIMULATION;

PHOTORESISTS;

EID: 17444394039     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.L186     Document Type: Article

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