Si etching in high-density SF6 plasmas for microfabrication: Surface roughness formation

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 312-318

  Gogolides, E ^a   Boukouras, C ^a   Kokkoris, G ^a   Brani, O ^a   Tserepi, A ^a   Constantoudis, V ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

Plasma etching induced roughness; Roughness simulation; Scaling analysis; Si etching; Surface roughness

Indexed keywords

COMPUTER SIMULATION; CORRELATION METHODS; ETCHING; MICROELECTROMECHANICAL DEVICES; PLASMAS; SILICON; SULFUR COMPOUNDS; SURFACE ROUGHNESS;

PLASMA ETCHING INDUCED ROUGHNESS; ROUGHNESS SIMULATION; SCALING ANALYSIS; SI ETCHING;

MICROELECTRONICS;

EID: 17344378057     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00117-0     Document Type: Conference Paper

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