Overview of sputter-deposited TiNi based thin films

Thin Film Shape Memory Alloys: Fundamentals and Device Applications

Volumn , Issue , 2009, Pages 1-72

  Miyazaki, S ^a   Fu, Y Q ^b   Huang, W M ^c  

^a UNIVERSITY OF TSUKUBA   (Japan)

^b HERIOT WATT UNIVERSITY   (United Kingdom)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; BINARY ALLOYS; COPPER ALLOYS; FILM PREPARATION; HAFNIUM ALLOYS; METAL IMPLANTS; MICROACTUATORS; MICROMACHINING; MICROSTRUCTURE; NICKEL ALLOYS; PALLADIUM ALLOYS; SHAPE MEMORY EFFECT; TEMPERATURE; TERNARY ALLOYS; TITANIUM ALLOYS;

FORCE AND DISPLACEMENTS; MICROMACHINING PROCESS; PER UNIT VOLUME; SHAPE MEMORY ALLOYS(SMA); THERMOMECHANICAL MODEL; TI-NI THIN FILM; TRANSFORMATION TEMPERATURES; VERY LOW TEMPERATURES;

THIN FILMS;

EID: 85011422306     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1017/CBO9780511635366.003     Document Type: Chapter

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