On the lower thickness boundary of sputtered TiNi films for shape memory application

Thin Solid Films

Volumn 515, Issue 1, 2006, Pages 80-86

  Fu, Y Q ^a,b   Zhang, Sam ^b   Wu, M J ^b   Huang, W M ^b   Du, H J ^b   Luo, J K ^a   Flewitt, A J ^a   Milne, W I ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Shape memory; Sputtering; Thickness; Thin film; TiNi

Indexed keywords

PHASE TRANSITIONS; RESIDUAL STRESSES; SHAPE MEMORY EFFECT; SPUTTERING; STOICHIOMETRY; THICKNESS MEASUREMENT; TITANIUM COMPOUNDS;

RECOVERY STRESS; SHAPE MEMORY APPLICATION; THICKNESS BOUNDARY; TINI;

THIN FILMS;

EID: 33750221962     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.039     Document Type: Article

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