Examination of the sputtering profile of NiTi under target heating conditions

Thin Solid Films

Volumn 413, Issue 1-2, 2002, Pages 1-7

  Ho, Ken K ^a   Mohanchandra, K P ^a   Carman, Gregory P ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

NiTi; Shape memory alloy; Sputtering; Thin film

Indexed keywords

COMPOSITION EFFECTS; COOLING; HEAT TREATMENT; NICKEL COMPOUNDS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SHAPE MEMORY EFFECT; SPUTTER DEPOSITION; STOICHIOMETRY; SUBSTRATES; TARGETS; THERMAL EFFECTS;

COMPOSITIONAL SHIFTS;

THIN FILMS;

EID: 0037166548     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00339-5     Document Type: Article

References (18)

1. Self-diffusion in b.c.c. Ti-V alloys