Functionally gradient NiTi films fabricated by sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 1 A, 1996, Pages 200-204

  Takabayashi, Sotohiro ^a   Tanino, Katsumi ^a   Fukumoto, Shigeru ^b   Mimatsu, Yoshitugu ^c   Yamashita, Shinya ^d   Ichikawa, Yoshio ^e  

^a TOYAMA INDUSTRIAL TECHNOLOGY CENTER   (Japan)

^b Takagiseiko Co Ltd   (Japan)

^c Tanaka Engineering Co Ltd   (Japan)

^d Hokuriku Denki Kogyo Co Ltd   (Japan)

^e Toyama Light Metal Indust Co Ltd   (Japan)

Author keywords

Calorimetry; Electric resistance; Functionally gradient film; NiTi shape memory alloy; RF magnetron sputtering

Indexed keywords

CRYSTAL STRUCTURE; CRYSTALLIZATION; CURRENT DENSITY; DEPOSITION; DIFFERENTIAL SCANNING CALORIMETRY; ELECTRIC RESISTANCE; FABRICATION; HEAT TREATMENT; MAGNETRON SPUTTERING; SHAPE MEMORY EFFECT; TITANIUM;

ELECTRIC RESISTANCE METER; FUNCTIONALLY GRADIENT FILMS; INPUT POWER CONTROL; MEMORIZATION; NICKEL TITANIUM SHAPE MEMORY ALLOY;

NICKEL ALLOYS;

EID: 0029733537     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.35.200     Document Type: Article

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