Transmission electron microscopy study of the microstructure of B19 martensite in sputter-deposited Ti50.2Ni30Cu19.8 thin films

Scripta Materialia

Volumn 59, Issue 4, 2008, Pages 451-454

  Meng, X L ^a   Sato, M ^a   Ishida, A ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Martensite; Microstructure; Sputtering; Thin films; Ti Ni Cu alloy

Indexed keywords

ANNEALING; MICROSTRUCTURE; SPUTTERING; THIN FILMS; TITANIUM ALLOYS;

ANNEALING TEMPERATURE; GRAIN BOUNDARY PRECIPITATES; TI-NI-CU ALLOYS;

MARTENSITE;

EID: 44749092984     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2008.04.023     Document Type: Article

References (14)

1. Fu Y., Du H., Huang W., Zhang S., and Min H. Sensor. Actuator. A 112 (2004) 395
2. Kohl M. Shape Memory Microactuators. first ed. (2004), Springer Verlag, Berlin
3. Chang L., and Grummon D.S. Phil. Mag. A 76 (1997) 163
4. Ishida A., Sato M., and Ogawa K. Phil. Mag. Lett. 86 (2006) 13
5. Ishida A., Sato M., Ogawa K., and Yamada K. Mater. Sci. Eng. A 438-440 (2006) 683
6. Miyazaki S., and Ishida A. Mater. Sci. Eng. A 273-275 (1999) 106
7. Saburi T., Watanabe Y., and Nenno S. ISIJ Int. 29 (1989) 405
8. Xie Z.L., Van Humbeeck J., Liu Y., and Delaey L. Scripta Mater. 37 (1997) 361
9. Ren X., and Otsuka K. Prog. Mater. Sci. 50 (2005) 511
10. Otsuka K., and Wayman C.M. Shape Memory Materials. first ed. (1998), Cambridge University Press, CA
11. Nam T.H., Saburi T., Nakata Y., and Shimizu K. Mater. Trans. JIM 31 (1990) 1050
12. Ishida A., and Sato M. Phil. Mag. 87 (2007) 5523
13. Nishida M., Itai I., Kitamura K., Chiba A., and Yamauchi K. J. Phys. IV 5 (1995) C8-635
14. Krishnan M., and Singh J.B. Acta Mater. 48 (2000) 1325