Characterization of sputtering deposited NiTi shape memory thin films using a temperature controllable atomic force microscope

Smart Materials and Structures

Volumn 13, Issue 5, 2004, Pages 977-982

  He, Q ^a,b   Huang, W M ^a   Hong, M H ^b   Wu, M J ^a   Fu, Y Q ^a   Chong, T C ^b   Chellet, F ^a   Du, H J ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b DATA STORAGE INSTITUTE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

MICROPUMPS; MONOCLINIC CRYSTALS; SHAPE MEMORY FILMS; SURFACE TO VOLUME RATIO;

ACTUATORS; ATOMIC FORCE MICROSCOPY; DIFFERENTIAL SCANNING CALORIMETRY; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; SHAPE MEMORY EFFECT; SPUTTER DEPOSITION; THERMAL EFFECTS;

THIN FILMS;

EID: 5744247297     PISSN: 09641726     EISSN: None     Source Type: Journal    
DOI: 10.1088/0964-1726/13/5/001     Document Type: Article

References (11)

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