Mechanical properties of Ti-Ni shape memory thin films formed by sputtering

Materials Science and Engineering: A

Volumn 273-275, Issue , 1999, Pages 754-757

  Ishida, A ^a   Sato, M ^a   Miyazaki, S ^b  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

Micromachine; Shape memory; Sputtering; Stress strain curve; Thin film; Ti Ni

Indexed keywords

ANNEALING; DUCTILITY; SHAPE MEMORY EFFECT; SPUTTER DEPOSITION; THERMAL EFFECTS; THIN FILMS;

MICROMACHINES;

TITANIUM ALLOYS;

EID: 0033337920     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0921-5093(99)00410-4     Document Type: Article

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