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Surface and Coatings Technology

Volumn 167, Issue 2-3, 2003, Pages 120-128

Sputtering deposited TiNi films: Relationship among processing, stress evolution and phase transformation behaviors

(3) Fu, Yongqing a Du, Hejun a Zhang, Sam a

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

Annealing; Curvature method; Martensite transformation; Shape memory; Sputtering; Stress; TiNi thin film

Indexed keywords

AMORPHOUS FILMS; ANNEALING; COMPOSITION; CRYSTALLIZATION; DENSIFICATION; PHASE TRANSITIONS; RESIDUAL STRESSES; SPUTTER DEPOSITION; STRESS RELAXATION; TENSILE STRENGTH; TENSILE STRESS; THERMAL STRESS;

STRESS EVOLUTION;

TITANIUM COMPOUNDS;

ANNEALING; COATING; MARTENSITE; SHAPE MEMORY ALLOY; SPUTTERING; TITANIUM NITRIDE;

EID: 0037461175 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(02)00896-4 Document Type: Article

Times cited : (79)

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