SCOPUS 정보 검색 플랫폼

Materials Science and Engineering: A

Volumn 273-275, Issue , 1999, Pages 717-721

Shape memory NiTi thin films deposited at low temperature

(6) Isalgue, A a Torra, V a Seguin, J L b Bendahan, M b Amigo, J M c Esteve Cano, V d

a UNIVERSITAT POLITÈCNICA DE CATALUNYA (Spain)

b AIX MARSEILLE UNIVERSITY (France)

c UNIVERSITY OF VALENCIA (Spain)

d UNIVERSITAT JAUME I (Spain)

Author keywords

Low temperature deposition; Martensitic transformation; NiTi thin films; Sputtering

Indexed keywords

ANNEALING; BINARY ALLOYS; CRYSTALLIZATION; CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; ELECTRODES; MARTENSITIC TRANSFORMATIONS; MICROACTUATORS; NICKEL ALLOYS; SCHOTTKY BARRIER DIODES; SHAPE MEMORY EFFECT; THERMAL EFFECTS;

LOW TEMPERATURE DEPOSITION;

METALLIC FILMS;

EID: 0039763549 PISSN: 09215093 EISSN: None Source Type: Journal
DOI: 10.1016/s0921-5093(99)00403-7 Document Type: Article

Times cited : (20)

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