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Volumn 74, Issue 1, 1999, Pages 242-245

NiTi thin films as a gate of M.O.S. capacity sensors

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC PROPERTIES; ELECTRODES; MICROACTUATORS; NICKEL ALLOYS; PHASE TRANSITIONS; SENSORS; SHAPE MEMORY EFFECT; SPUTTER DEPOSITION;

EID: 0032677314     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(98)00350-1     Document Type: Article
Times cited : (23)

References (10)
  • 1
    • 0026119097 scopus 로고
    • Vacuum-deposited TiNi shape memory film: characterization and applications in microdevices
    • D. Johnson Vacuum-deposited TiNi shape memory film: characterization and applications in microdevices J. Micromech. Microeng. 1 1990 34 41
    • (1990) J. Micromech. Microeng. , vol.1 , pp. 34-41
    • Johnson, D.1
  • 3
    • 85120099134 scopus 로고    scopus 로고
    • E. Patoor, M. Berveiller, Technologie des Alliages â Mémoire de Forme, Hermès, Paris, 1994.
  • 4
    • 85120097400 scopus 로고    scopus 로고
    • G. Guenin, Techniques de l'Ingénieur, Les alliages â mémoire de forme, M530-8.
  • 5
    • 0031073116 scopus 로고    scopus 로고
    • New type of Schottky barriers using NiTi shape memory alloy films
    • M. Bendahan J.-L. Seguin D. Lollman H. Carchano New type of Schottky barriers using NiTi shape memory alloy films Thin Solid Films 294 1–2 1997 278 280
    • (1997) Thin Solid Films , vol.294 , Issue.1–2 , pp. 278-280
    • Bendahan, M.1    Seguin, J.-L.2    Lollman, D.3    Carchano, H.4
  • 7
    • 0030234734 scopus 로고    scopus 로고
    • NiTi shape memory alloy films: composition control using optical emission spectroscopy
    • M. Bendahan J.-L. Seguin P. Canet H. Carchano NiTi shape memory alloy films: composition control using optical emission spectroscopy Thin Solid Films 283 1996 61 66
    • (1996) Thin Solid Films , vol.283 , pp. 61-66
    • Bendahan, M.1    Seguin, J.-L.2    Canet, P.3    Carchano, H.4
  • 8
    • 85120146329 scopus 로고    scopus 로고
    • J.L. Seguin, M. Bendahan, A. Isalgue, V. Esteve-Cano, H. Carchano, V. Torra, EMRS 98, 16–19 juin, Grenoble, Symposium H: Materials Aspects in Microsystem Technologies, accepted publication in sensors and Actuators A.
  • 10
    • 0020824265 scopus 로고
    • Stress in chemical-vapor-deposited SiO2 and plasma-SiNx films on GaAs and Si
    • x films on GaAs and Si J.A.P 54 9 1983 5064
    • (1983) J.A.P , vol.54 , Issue.9 , pp. 5064
    • Blaauw, C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.