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Volumn 74, Issue 1, 1999, Pages 242-245
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NiTi thin films as a gate of M.O.S. capacity sensors
a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL STRUCTURE;
CURRENT VOLTAGE CHARACTERISTICS;
ELECTRIC PROPERTIES;
ELECTRODES;
MICROACTUATORS;
NICKEL ALLOYS;
PHASE TRANSITIONS;
SENSORS;
SHAPE MEMORY EFFECT;
SPUTTER DEPOSITION;
ELECTRIC CHARACTERIZATION;
MOS CAPACITIVE SENSOR;
THIN FILMS;
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EID: 0032677314
PISSN: 09244247
EISSN: None
Source Type: Journal
DOI: 10.1016/S0924-4247(98)00350-1 Document Type: Article |
Times cited : (23)
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References (10)
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