Recent applications of hard x-ray photoelectron spectroscopy

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 34, Issue 3, 2016, Pages

  Weiland, Conan ^a   Rumaiz, Abdul K ^b   Pianetta, Piero ^c   Woicik, Joseph C ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b BROOKHAVEN NATIONAL LABORATORY   (United States)

^c SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFACES (MATERIALS); MULTILAYERS; PHOTOELECTRONS; PHOTONS; X RAYS;

BURIED INTERFACE; HARD X-RAY PHOTOELECTRON SPECTROSCOPY; OPERANDO; PHOTOEMISSION MEASUREMENTS; RESONANT EXCITATION; SOFT X-RAY; ULTRAVIOLET PHOTON; X-RAY STANDING WAVES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84973603529     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4946046     Document Type: Review

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