Parameterization of HAXPES photoelectrons with kinetic energies up to 10 keV

Applied Surface Science

Volumn 346, Issue , 2015, Pages 503-519

  Jablonski, A ^a  

^a INSTITUTE OF PHYSICAL CHEMISTRY   (Poland)

Author keywords

Effective attenuation length; Hard X ray photoelectron spectroscopy (HAXPES); High energy laboratory X ray sources; Mean escape depth; Photoelectron signal intensity

Indexed keywords

KINETIC ENERGY; PHOTOELECTRONS; PHOTOEMISSION; PHOTONS; X RAYS;

EFFECTIVE ATTENUATION LENGTH; ESCAPE DEPTH; HAX-PES; PHOTOELECTRON SIGNALS; X-RAY SOURCES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84930020266     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2015.04.028     Document Type: Article

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