Chemically resolved depth profiles extracted from ARXPS data taken on polystyrene surfaces exposed to nitrogen plasmas

Plasma Processes and Polymers

Volumn 4, Issue 4, 2007, Pages 406-413

  Payter, R W ^a   Roy Guay, D ^b  

^a INRS EMT   (Canada)

^b UNIVERSITÉ DE SHERBROOKE   (Canada)

Author keywords

Angle resolved XPS; Diffusion; ESCA; Nitrogen plasma; Surfaces

Indexed keywords

CHEMICAL BONDS; DEPTH PROFILING; DIFFUSION; PHOTOELECTRON SPECTROSCOPY; PLASMAS;

ELEMENTAL PEAK INTENSITY; MAXIMUM ENTROPY METHOD; NITROGEN PLASMA; PLASMA DURATION;

POLYSTYRENES;

EID: 34250179854     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200600093     Document Type: Article

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