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Volumn 47, Issue 2, 2015, Pages 265-269

Thickness and coverage determination of multilayer with an island-like overlayer by hard X-ray photoelectron spectroscopy at multiple photon energies

(10) Isomura, N a Kataoka, K a Horibuchi, K a Dohmae, K a Oji, H b Cui, Y T b,c Son, J Y b Kitazumi, K a Takahashi, N a Kimoto, Y a

a Rd Management Section (Japan)

b JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE (Japan)

c UNIVERSITY OF TOKYO (Japan)

Author keywords

Compositional depth profile; HAXPES; Nondestructive; Photon energy; Surface roughness; Take off angle

Indexed keywords

CURVE FITTING; MULTILAYERS; PHOTOELECTRONS; SILICON; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

COMPOSITIONAL DEPTH PROFILE; HAX-PES; NON DESTRUCTIVE; PHOTON ENERGY; TAKE-OFF ANGLE;

PHOTONS;

EID: 84921866575 PISSN: 01422421 EISSN: 10969918 Source Type: Journal
DOI: 10.1002/sia.5701 Document Type: Article

Times cited : (6)

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