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Applied Physics Letters

Volumn 101, Issue 6, 2012, Pages

Hard x-ray photoelectron spectroscopy study of As and Ga out-diffusion in In 0.53Ga 0.47As/Al 2O 3 film systems

(5) Weiland, C a Lysaght, P b Price, J b Huang, J b Woicik, J C a

a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

b SEMATECH (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEAL TEMPERATURES; BEAM ENERGIES; GATE STACKS; HARD X-RAY PHOTOELECTRON SPECTROSCOPY; OUT-DIFFUSION; SURFACE SENSITIVITY;

DIFFUSION; GALLIUM; PHOTOELECTRONS; X RAY PHOTOELECTRON SPECTROSCOPY;

GALLIUM ALLOYS;

EID: 84865152478 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.4745207 Document Type: Article

Times cited : (26)

References (27)

1
- 54949095165
- 10.1149/1.2988045
- G. Brammertz, H. C. Lin, K. Martens, D. Mercier, C. Merckling, J. Penaud, C. Adelmann, S. Sioncke, W. E. Wang, M. Caymax, M. Meuris, and M. Heyns, J. Electrochem. Soc. 155, H945 (2008). 10.1149/1.2988045
- (2008) J. Electrochem. Soc. , vol.155 , pp. 945
- Brammertz, G.¹ Lin, H.C.² Martens, K.³ Mercier, D.⁴ Merckling, C.⁵ Penaud, J.⁶ Adelmann, C.⁷ Sioncke, S.⁸ Wang, W.E.⁹ Caymax, M.¹⁰ Meuris, M.¹¹ Heyns, M.¹²

2
- 65449127795
- 10.1063/1.3120546
- C. L. Hinkle, M. Milojevic, B. Brennan, A. M. Sonnet, F. S. Aguirre-Tostado, G. J. Hughes, E. M. Vogel, and R. M. Wallace, Appl. Phys. Lett. 94, 162101 (2009). 10.1063/1.3120546
- (2009) Appl. Phys. Lett. , vol.94 , pp. 162101
- Hinkle, C.L.¹ Milojevic, M.² Brennan, B.³ Sonnet, A.M.⁴ Aguirre-Tostado, F.S.⁵ Hughes, G.J.⁶ Vogel, E.M.⁷ Wallace, R.M.⁸

3
- 79551679906
- 10.1063/1.3537915
- C.-W. Cheng, G. Apostolopoulos, and E. A. Fitzgerald, J. Appl. Phys. 109, 023714 (2011). 10.1063/1.3537915
- (2011) J. Appl. Phys. , vol.109 , pp. 023714
- Cheng, C.-W.¹ Apostolopoulos, G.² Fitzgerald, E.A.³

4
- 79961038335
- 10.1063/1.3617436
- L. K. Chu, C. Merckling, A. Alian, J. Dekoster, J. Kwo, M. Hong, M. Caymax, and M. Heyns, Appl. Phys. Lett. 99, 042908 (2011). 10.1063/1.3617436
- (2011) Appl. Phys. Lett. , vol.99 , pp. 042908
- Chu, L.K.¹ Merckling, C.² Alian, A.³ Dekoster, J.⁴ Kwo, J.⁵ Hong, M.⁶ Caymax, M.⁷ Heyns, M.⁸

5
- 79952090346
- 10.1063/1.3556619
- L. Lin and J. Robertson, Appl. Phys. Lett. 98, 082903 (2011). 10.1063/1.3556619
- (2011) Appl. Phys. Lett. , vol.98 , pp. 082903
- Lin, L.¹ Robertson, J.²

6
- 82955241265
- 10.1063/1.3665061
- J. Robertson and L. Lin, Appl. Phys. Lett. 99, 222906 (2011). 10.1063/1.3665061
- (2011) Appl. Phys. Lett. , vol.99 , pp. 222906
- Robertson, J.¹ Lin, L.²

7
- 78650590738
- 10.1021/jp107880r
- W. Wang, K. Xiong, R. M. Wallace, and K. Cho, J. Phys. Chem. C 114, 22610-22618 (2010). 10.1021/jp107880r
- (2010) J. Phys. Chem. C , vol.114 , pp. 22610-22618
- Wang, W.¹ Xiong, K.² Wallace, R.M.³ Cho, K.⁴

8
- 33845892121
- 10.1063/1.2405387
- C.-H. Chang, Y.-K. Chiou, Y.-C. Chang, K.-Y. Lee, T.-D. Lin, T.-B. Wu, M. Hong, and J. Kwo, Appl. Phys. Lett. 89, 242911 (2006). 10.1063/1.2405387
- (2006) Appl. Phys. Lett. , vol.89 , pp. 242911
- Chang, C.-H.¹ Chiou, Y.-K.² Chang, Y.-C.³ Lee, K.-Y.⁴ Lin, T.-D.⁵ Wu, T.-B.⁶ Hong, M.⁷ Kwo, J.⁸

9
- 79751524419
- 10.1016/j.mee.2010.09.015
- Y. H. Chang, M. L. Huang, P. Chang, C. A. Lin, Y. J. Chu, B. R. Chen, C. L. Hsu, J. Kwo, T. W. Pi, and M. Hong, Microelectron. Eng. 88, 440-443 (2011). 10.1016/j.mee.2010.09.015
- (2011) Microelectron. Eng. , vol.88 , pp. 440-443
- Chang, Y.H.¹ Huang, M.L.² Chang, P.³ Lin, C.A.⁴ Chu, Y.J.⁵ Chen, B.R.⁶ Hsu, C.L.⁷ Kwo, J.⁸ Pi, T.W.⁹ Hong, M.¹⁰

10
- 80051598917
- 10.1063/1.3615680
- M. El Kazzi, L. Czornomaz, D. J. Webb, C. Rossel, D. Caimi, H. Siegwart, J. Fompeyrine, and C. Marchiori, Appl. Phys. Lett. 99, 052102 (2011). 10.1063/1.3615680
- (2011) Appl. Phys. Lett. , vol.99 , pp. 052102
- El Kazzi, M.¹ Czornomaz, L.² Webb, D.J.³ Rossel, C.⁴ Caimi, D.⁵ Siegwart, H.⁶ Fompeyrine, J.⁷ Marchiori, C.⁸

11
- 20844440321
- 10.1063/1.1899745
- M. M. Frank, G. D. Wilk, D. Starodub, T. Gustafsson, E. Garfunkel, Y. J. Chabal, J. Grazul, and D. A. Muller, Appl. Phys. Lett. 86, 152904 (2005). 10.1063/1.1899745
- (2005) Appl. Phys. Lett. , vol.86 , pp. 152904
- Frank, M.M.¹ Wilk, G.D.² Starodub, D.³ Gustafsson, T.⁴ Garfunkel, E.⁵ Chabal, Y.J.⁶ Grazul, J.⁷ Muller, D.A.⁸

12
- 74249104392
- 10.1016/j.tsf.2009.08.028
- T. Gougousi and J. W. Lacis, Thin Solid Films 518, 2006-2009 (2010). 10.1016/j.tsf.2009.08.028
- (2010) Thin Solid Films , vol.518 , pp. 2006-2009
- Gougousi, T.¹ Lacis, J.W.²

13
- 39749157907
- 10.1063/1.2883956
- C. L. Hinkle, A. M. Sonnet, E. M. Vogel, S. McDonnell, G. J. Hughes, M. Milojevic, B. Lee, F. S. Aguirre-Tostado, K. J. Choi, H. C. Kim, J. Kim, and R. M. Wallace, Appl. Phys. Lett. 92, 071901 (2008). 10.1063/1.2883956
- (2008) Appl. Phys. Lett. , vol.92 , pp. 071901
- Hinkle, C.L.¹ Sonnet, A.M.² Vogel, E.M.³ McDonnell, S.⁴ Hughes, G.J.⁵ Milojevic, M.⁶ Lee, B.⁷ Aguirre-Tostado, F.S.⁸ Choi, K.J.⁹ Kim, H.C.¹⁰ Kim, J.¹¹ Wallace, R.M.¹²

14
- 42349084605
- 10.1149/1.2906129
- C. H. Hou, M. C. Chen, C. H. Chang, T. B. Wu, and C. D. Chiang, Electrochem. Solid-State Lett. 11, D60-D63 (2008). 10.1149/1.2906129
- (2008) Electrochem. Solid-State Lett. , vol.11
- Hou, C.H.¹ Chen, M.C.² Chang, C.H.³ Wu, T.B.⁴ Chiang, C.D.⁵

15
- 56849122383
- 10.1063/1.3033404
- M. Milojevic, F. S. Aguirre-Tostado, C. L. Hinkle, H. C. Kim, E. M. Vogel, J. Kim, and R. M. Wallace, Appl. Phys. Lett. 93, 202902 (2008). 10.1063/1.3033404
- (2008) Appl. Phys. Lett. , vol.93 , pp. 202902
- Milojevic, M.¹ Aguirre-Tostado, F.S.² Hinkle, C.L.³ Kim, H.C.⁴ Vogel, E.M.⁵ Kim, J.⁶ Wallace, R.M.⁷

16
- 79961084696
- 10.1063/1.3615784
- M. Tallarida, C. Adelmann, A. Delabie, S. Van Elshocht, M. Caymax, and D. Schmeisser, Appl. Phys. Lett. 99, 042906 (2011). 10.1063/1.3615784
- (2011) Appl. Phys. Lett. , vol.99 , pp. 042906
- Tallarida, M.¹ Adelmann, C.² Delabie, A.³ Van Elshocht, S.⁴ Caymax, M.⁵ Schmeisser, D.⁶

17
- 33745434697
- 10.1063/1.2216023
- H.-S. Kim, I. Ok, M. Zhang, C. Choi, T. Lee, F. Zhu, G. Thareja, L. Yu, and J. C. Lee, Appl. Phys. Lett. 88, 252906 (2006). 10.1063/1.2216023
- (2006) Appl. Phys. Lett. , vol.88 , pp. 252906
- Kim, H.-S.¹ Ok, I.² Zhang, M.³ Choi, C.⁴ Lee, T.⁵ Zhu, F.⁶ Thareja, G.⁷ Yu, L.⁸ Lee, J.C.⁹

18
- 77955763640
- 10.1149/1.3465300
- S. A. Suleiman, H. J. Oh, A. Du, C. M. Ng, and S. J. Lee, Electrochem. Solid-State Lett. 13, H336-H338 (2010). 10.1149/1.3465300
- (2010) Electrochem. Solid-State Lett. , vol.13
- Suleiman, S.A.¹ Oh, H.J.² Du, A.³ Ng, C.M.⁴ Lee, S.J.⁵

19
- 34547912197
- 10.1109/TED.2007.901261
- G. K. Dalapati, Yi Tong, Wei-Yip Loh, Hoe Keat Mun, and Byung Jin Cho, IEEE Trans. Electron Devices 54, 1831-1837 (2007). 10.1109/TED.2007.901261
- (2007) IEEE Trans. Electron Devices , vol.54 , pp. 1831-1837
- Dalapati, G.K.¹ Tong, Y.² Loh, W.-Y.³ Keat Mun, H.⁴ Jin Cho, B.⁵

20
- 33847737038
- 10.1063/1.2422746
- P. S. Lysaght, J. Barnett, G. I. Bersuker, J. C. Woicik, D. A. Fischer, B. Foran, H.-H. Tseng, and R. Jammy, J. Appl. Phys. 101, 024105 (2007). 10.1063/1.2422746
- (2007) J. Appl. Phys. , vol.101 , pp. 024105
- Lysaght, P.S.¹ Barnett, J.² Bersuker, G.I.³ Woicik, J.C.⁴ Fischer, D.A.⁵ Foran, B.⁶ Tseng, H.-H.⁷ Jammy, R.⁸

21
- 0026120277
- 10.1016/0039-6028(91)90176-S
- S. Tougaard, H. Hansen, and M. Neumann, Surf. Sci. 244, 125-134 (1991). 10.1016/0039-6028(91)90176-S
- (1991) Surf. Sci. , vol.244 , pp. 125-134
- Tougaard, S.¹ Hansen, H.² Neumann, M.³

22
- 0343474494
- 10.1016/0368-2048(92)85006-S
- M. Procop, J. Electron Spectrosc. Relat. Phenom. 59, R1-R10 (1992). 10.1016/0368-2048(92)85006-S
- (1992) J. Electron Spectrosc. Relat. Phenom. , vol.59
- Procop, M.¹

23
- 0000105939
- 10.1016/0092-640X(79)90027-5
- I. M. Band, Y. I. Kharitonov, and M. B. Trzhaskovskaya, Atomic Data Nucl. Data Tables 23, 443-505 (1979). 10.1016/0092-640X(79)90027-5
- (1979) Atomic Data Nucl. Data Tables , vol.23 , pp. 443-505
- Band, I.M.¹ Kharitonov, Y.I.² Trzhaskovskaya, M.B.³

24
- 0037339998
- 10.1002/sia.1526
- S. Tanuma, C. J. Powell, and D. R. Penn, Surf. Interf. Anal. 35, 268-275 (2003). 10.1002/sia.1526
- (2003) Surf. Interf. Anal. , vol.35 , pp. 268-275
- Tanuma, S.¹ Powell, C.J.² Penn, D.R.³

25
- 9644281309
- 10.1103/PhysRevLett.35.1356
- P. Pianetta, I. Lindau, C. Garner, and W. E. Spicer, Phys. Rev. Lett. 35, 1356-1359 (1975). 10.1103/PhysRevLett.35.1356
- (1975) Phys. Rev. Lett. , vol.35 , pp. 1356-1359
- Pianetta, P.¹ Lindau, I.² Garner, C.³ Spicer, W.E.⁴

26
- 0028444677
- 10.1016/0368-2048(93)02035-K
- A. K. Livesey and G. C. Smith, J. Electron Spectrosc. Relat. Phenom. 67, 439-461 (1994). 10.1016/0368-2048(93)02035-K
- (1994) J. Electron Spectrosc. Relat. Phenom. , vol.67 , pp. 439-461
- Livesey, A.K.¹ Smith, G.C.²

27
- 84865110943
- Hsinchu, Taiwan, 25-27 April 2011, 1-2.
- N. Goel, P. Lysaght, D. Veksler, P. Nagaiah, S. Oktyabrksy, J. Price, H. Zhao, Y. T. Chen, J. C. Lee, J. C. Woicik, P. Majhi, P. D. Kirsch, R. Jammy, International Symposium on VLSI Technology, Systems and Applications, Hsinchu, Taiwan, 25-27 April 2011, pp. 1-2.
- International Symposium on VLSI Technology, Systems and Applications
- Goel, N.¹ Lysaght, P.² Veksler, D.³ Nagaiah, P.⁴ Oktyabrksy, S.⁵ Price, J.⁶ Zhao, H.⁷ Chen, Y.T.⁸ Lee, J.C.⁹ Woicik, J.C.¹⁰ Majhi, P.¹¹ Kirsch, P.D.¹² Jammy, R.¹³

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