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Journal of Electron Spectroscopy and Related Phenomena

Volumn 190, Issue PART B, 2013, Pages 193-200

NIST high throughput variable kinetic energy hard X-ray photoelectron spectroscopy facility

(6) Weiland, C a Rumaiz, A K b Lysaght, P c Karlin, B a Woicik, J C a Fischer, D a

a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

b BROOKHAVEN NATIONAL LABORATORY (United States)

c SEMATECH (United States)

Author keywords

HAXPES; Photoelectron spectroscopy; Synchrotron techniques

Indexed keywords

DEPTH DEPENDENTS; DESIGN AND OPERATIONS; HARD X-RAY PHOTOELECTRON SPECTROSCOPY; HAX-PES; NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY; NATIONAL SYNCHROTRON LIGHT SOURCES; SEMICONDUCTOR FILMS; SYNCHROTRON TECHNIQUES;

DIELECTRIC MATERIALS; ELECTRONIC STRUCTURE; FILMS; KINETIC ENERGY; KINETICS; MICROELECTRONICS; PHOTOELECTRON SPECTROSCOPY; PHOTOELECTRONS; X RAY PHOTOELECTRON SPECTROSCOPY;

INTERFACES (MATERIALS);

EID: 84890127009 PISSN: 03682048 EISSN: None Source Type: Journal
DOI: 10.1016/j.elspec.2013.04.008 Document Type: Article

Times cited : (15)

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