Surface sensitivity of X-ray photoelectron spectroscopy

Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Volumn 601, Issue 1-2, 2009, Pages 54-65

  Powell, C J ^a   Jablonski, A ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b INSTITUTE OF PHYSICAL CHEMISTRY   (Poland)

Author keywords

Effective attenuation length; Inelastic mean free path; Mean escape depth; Surface sensitivity; X ray photoelectron spectroscopy

Indexed keywords

ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRONS; MOLECULAR ORBITALS; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; SECURITY OF DATA; SINGLE CRYSTAL SURFACES; SPECTRUM ANALYSIS;

ANALYTICAL EXPRESSIONS; EFFECTIVE ATTENUATION LENGTH; ELECTRON ENERGIES; INELASTIC MEAN FREE PATH; INFORMATION DEPTHS; MEAN ESCAPE DEPTH; NUMERICAL VALUES; SCATTERING PROPERTIES; SIGNAL ELECTRONS; SURFACE SENSITIVITY;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 61549099030     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nima.2008.12.103     Document Type: Article

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