SCOPUS 정보 검색 플랫폼

Volumn 99, Issue 22, 2011, Pages

Bias application hard x-ray photoelectron spectroscopy study of forming process of Cu/HfO2/Pt resistive random access memory structure

(7) Nagata, T a Haemori, M a Yamashita, Y a Yoshikawa, H a Iwashita, Y a,b Kobayashi, K a Chikyow, T a

a NATIONAL INSTITUTE FOR MATERIALS SCIENCE (Japan)

b MEIJI UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BIAS OPERATION; BONDING STATE; CU DIFFUSION; DEVICE OPERATIONS; FORMING PROCESS; HARD X-RAY PHOTOELECTRON SPECTROSCOPY; INTENSITY RATIO; METAL FILAMENTS; RESISTANCE SWITCHING; RESISTIVE RANDOM ACCESS MEMORY;

HAFNIUM; HAFNIUM OXIDES; PHOTONS; PLATINUM; RANDOM ACCESS STORAGE;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 82955213606 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3664781 Document Type: Article

Times cited : (63)

References (27)

1
- 35748974883
- Nanoionics-based resistive switching memories
- DOI 10.1038/nmat2023, PII NMAT2023
- R. Waser and M. Aono, Nature Mater. 6, 833 (2007). 10.1038/nmat2023 (Pubitemid 350064191)
- (2007) Nature Materials , vol.6 , Issue.11 , pp. 833-840
- Waser, R.¹ Aono, M.²

2
- 58149247724
- 10.1063/1.3041475
- Y.-M. Kim and J.-S. Lee, J. Appl. Phys. 104, 114115 (2008). 10.1063/1.3041475
- (2008) J. Appl. Phys. , vol.104 , pp. 114115
- Kim, Y.-M.¹ Lee, J.-S.²

3
- 34548406505
- Electronic transport in Ta2 O5 resistive switch
- DOI 10.1063/1.2777170
- T. Sakamoto, K. Lister, N. Banno, T. Hasegawa, K. Terabe, and M. Aono, Appl. Phys. Lett. 91, 92110 (2007). 10.1063/1.2777170 (Pubitemid 47352295)
- (2007) Applied Physics Letters , vol.91 , Issue.9 , pp. 092110
- Sakamoto, T.¹ Lister, K.² Banno, N.³ Hasegawa, T.⁴ Terabe, K.⁵ Aono, M.⁶

4
- 0000551766
- 10.1063/1.124036
- G. D. Wilk and R. M. Wallace, Appl. Phys. Lett. 74, 2854 (1999). 10.1063/1.124036
- (1999) Appl. Phys. Lett. , vol.74 , pp. 2854
- Wilk, G.D.¹ Wallace, R.M.²

5
- 31044455312
- High dielectric constant gate oxides for metal oxide Si transistors
- DOI 10.1088/0034-4885/69/2/R02, PII S0034488506721856
- J. Robertson, Rep. Prog. Phys. 69, 327 (2006). 10.1088/0034-4885/69/2/R02 (Pubitemid 43121643)
- (2006) Reports on Progress in Physics , vol.69 , Issue.2 , pp. 327-396
- Robertson, J.¹

6
- 37549002104
- 10.1149/1.2814153
- S. Lee, W.-G. Kim, S.-W. Rhee, and K. Yong, J. Electrochem. Soc. 155, H92 (2008). 10.1149/1.2814153
- (2008) J. Electrochem. Soc. , vol.155 , pp. 92
- Lee, S.¹ Kim, W.-G.² Rhee, S.-W.³ Yong, K.⁴

7
- 67949121971
- 10.1143/APEX.2.061401
- M. Haemori, T. Nagata, and T. Chikyow, Appl. Phys. Express 2, 061401 (2009). 10.1143/APEX.2.061401
- (2009) Appl. Phys. Express , vol.2 , pp. 061401
- Haemori, M.¹ Nagata, T.² Chikyow, T.³

8
- 67649143212
- 10.1088/0957-4484/20/21/215201
- J. J. Yang, F. Miao, M. D. Pickett, D. A. A. Ohlberg, D. R. Stewart, C. N. Lau, and R. S. Williams, Nanotechnology 20, 215201 (2009). 10.1088/0957-4484/20/21/215201
- (2009) Nanotechnology , vol.20 , pp. 215201
- Yang, J.J.¹ Miao, F.² Pickett, M.D.³ Ohlberg, D.A.A.⁴ Stewart, D.R.⁵ Lau, C.N.⁶ Williams, R.S.⁷

9
- 49149127469
- 10.1063/1.2966141
- C. Yoshida, K. Kinoshita, T. Yamasaki, and Y. Sugiyama, Appl. Phys. Lett. 93, 042106 (2008). 10.1063/1.2966141
- (2008) Appl. Phys. Lett. , vol.93 , pp. 042106
- Yoshida, C.¹ Kinoshita, K.² Yamasaki, T.³ Sugiyama, Y.⁴

10
- 56349110380
- 10.1002/pssr.200802003
- H. Shima, F. Takano, H. Muramatsu, M. Yamazaki, H. Akinaga, and A. Kogure, Phys. Status Solidi 2, 99 (2008). 10.1002/pssr.200802003
- (2008) Phys. Status Solidi , vol.2 , pp. 99
- Shima, H.¹ Takano, F.² Muramatsu, H.³ Yamazaki, M.⁴ Akinaga, H.⁵ Kogure, A.⁶

11
- 33645889383
- 10.1016/0038-1101(64)90131-5
- J. F. Gibbons and W. E. Beadle, Solid-State Electron 7, 785 (1964). 10.1016/0038-1101(64)90131-5
- (1964) Solid-State Electron , vol.7 , pp. 785
- Gibbons, J.F.¹ Beadle, W.E.²

12
- 66949114273
- 10.1143/APEX.2.055002
- T. Tsuchiya, Y. Oyama, S. Miyoshi, and S. Yamaguchi, Appl. Phys. Express 2, 055002 (2009). 10.1143/APEX.2.055002
- (2009) Appl. Phys. Express , vol.2 , pp. 055002
- Tsuchiya, T.¹ Oyama, Y.² Miyoshi, S.³ Yamaguchi, S.⁴

13
- 77956208722
- 10.1063/1.3483756
- T. Nagata, M. Haemori, Y. Yamashita, Y. Iwashita, H. Yoshikawa, K. Kobayashi, and T. Chikyow, Appl. Phys. Lett. 97, 082902 (2010). 10.1063/1.3483756
- (2010) Appl. Phys. Lett. , vol.97 , pp. 082902
- Nagata, T.¹ Haemori, M.² Yamashita, Y.³ Iwashita, Y.⁴ Yoshikawa, H.⁵ Kobayashi, K.⁶ Chikyow, T.⁷

14
- 77958591143
- 10.1088/0957-4484/21/42/425205
- T. Tsuruoka, K. Terabe, T. Hasegawa, and M. Aono, Nanotechnology 21, 425205 (2010). 10.1088/0957-4484/21/42/425205
- (2010) Nanotechnology , vol.21 , pp. 425205
- Tsuruoka, T.¹ Terabe, K.² Hasegawa, T.³ Aono, M.⁴

15
- 77952784663
- 10.1380/ejssnt.2010.81
- Y. Yamashita, K. Ohmori, S. Ueda, H. Yoshikawa, T. Chikyow, and K. Kobayashi, e-J. Surf. Sci. Nanotechnol. 8, 81 (2010). 10.1380/ejssnt.2010.81
- (2010) E-J. Surf. Sci. Nanotechnol. , vol.8 , pp. 81
- Yamashita, Y.¹ Ohmori, K.² Ueda, S.³ Yoshikawa, H.⁴ Chikyow, T.⁵ Kobayashi, K.⁶

16
- 30244509840
- 10.1088/0022-3719/3/2/010
- S. Doniach and M. unji, J. Phys. C 3, 285 (1970). 10.1088/0022-3719/3/2/ 010
- (1970) J. Phys. C , vol.3 , pp. 285
- Doniach, S.¹ Unji, M.²

17
- 33744538097
- 10.1103/PhysRevB.5.4709
- D. A. Shirley, Phys. Rev. B 5, 4709 (1972). 10.1103/PhysRevB.5.4709
- (1972) Phys. Rev. B , vol.5 , pp. 4709
- Shirley, D.A.¹

18
- 0028387002
- 10.1002/sia.v21:3
- S. Tanuma, C. J. Powell, and D. R. Penn, Surf. Interface Anal. 21, 165 (1994). 10.1002/sia.v21:3
- (1994) Surf. Interface Anal. , vol.21 , pp. 165
- Tanuma, S.¹ Powell, C.J.² Penn, D.R.³

19
- 3643076747
- 10.1103/PhysRevB.38.11322
- J. Ghijsen, L. H. Tjeng, J. van Elp, H. Eskes, J. Westerink, G. A. Sawatzky, and M. T. Czyzyk, Phys. Rev. B 38, 11322 (1988). 10.1103/PhysRevB.38. 11322
- (1988) Phys. Rev. B , vol.38 , pp. 11322
- Ghijsen, J.¹ Tjeng, L.H.² Van Elp, J.³ Eskes, H.⁴ Westerink, J.⁵ Sawatzky, G.A.⁶ Czyzyk, M.T.⁷

20
- 0000257882
- 10.1016/0039-6028(85)90383-8
- G. Panzner, B. Egert, and H. P. Schmidt, Surf. Sci. 151, 400 (1985). 10.1016/0039-6028(85)90383-8
- (1985) Surf. Sci. , vol.151 , pp. 400
- Panzner, G.¹ Egert, B.² Schmidt, H.P.³

21
- 33947448981
- 10.1021/ja01167a079
- T. N. Rhodin, Jr., J. Am. Chem. Soc. 72, 5102 (1950). 10.1021/ja01167a079
- (1950) J. Am. Chem. Soc. , vol.72 , pp. 5102
- Rhodin Jr., T.N.¹

22
- 33751429016
- Native oxidation of ultra high purity Cu bulk and thin films
- DOI 10.1016/j.apsusc.2006.05.063, PII S0169433206007744
- J. Iijima, J.-W. Lim, S.-H. Hong, S. Suzuki, K. Mimura, and M. Isshiki, Appl. Surf. Sci. 253, 2825 (2006). 10.1016/j.apsusc.2006.05.063 (Pubitemid 44820567)
- (2006) Applied Surface Science , vol.253 , Issue.5 , pp. 2825-2829
- Iijima, J.¹ Lim, J.-W.² Hong, S.-H.³ Suzuki, S.⁴ Mimura, K.⁵ Isshiki, M.⁶

23
- 3343006353
- 10.1103/PhysRevB.38.6084
- F. J. Himpsel, F. R. McFeely, A. Taleb-Ibrahimi, J. A. Yarmoff, and G. Hollinger, Phys. Rev. B 38, 6084 (1988). 10.1103/PhysRevB.38.6084
- (1988) Phys. Rev. B , vol.38 , pp. 6084
- Himpsel, F.J.¹ McFeely, F.R.² Taleb-Ibrahimi, A.³ Yarmoff, J.A.⁴ Hollinger, G.⁵

24
- 0042377613
- 10.1063/1.1595714
- K. Kobayashi, M. Yabashi, Y. Takata, T. Tokushima, S. Shin, K. Tamasaku, D. Miwa, T. Ishikawa, H. Nohira, T. Hattori, Appl. Phys. Lett. 85, 1005 (2003). 10.1063/1.1595714
- (2003) Appl. Phys. Lett. , vol.85 , pp. 1005
- Kobayashi, K.¹ Yabashi, M.² Takata, Y.³ Tokushima, T.⁴ Shin, S.⁵ Tamasaku, K.⁶ Miwa, D.⁷ Ishikawa, T.⁸ Nohira, H.⁹ Hattori, T.¹⁰

25
- 77951550776
- 10.1116/11.20080401
- D. Barreca, A. Milanov, R. A. Fischer, A. Devi, and E. Tondello, Surf. Sci. Spectra 14, 34 (2007). 10.1116/11.20080401
- (2007) Surf. Sci. Spectra , vol.14 , pp. 34
- Barreca, D.¹ Milanov, A.² Fischer, R.A.³ Devi, A.⁴ Tondello, E.⁵

26
- 0003561662
- 2nd ed. (Wiley, New York).
- A. J. Bard and L. R. Faulkner, Electrochemical Methods. Fundamentals and Applications, 2nd ed. (Wiley, New York, 2001).
- (2001) Electrochemical Methods. Fundamentals and Applications
- Bard, A.J.¹ Faulkner, L.R.²

27
- 0035393228
- General rule for predicting surface segregation of substrate metal on film surface
- DOI 10.1116/1.1376699
- M. Yoshitake, Y.-R. Aparna, and K. Yoshihara, J. Vac. Sci. Technol. A 19, 1432 (2001). 10.1116/1.1376699 (Pubitemid 32699472)
- (2001) Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films , vol.19 , Issue.4 , pp. 1432-1437
- Yoshitake, M.¹ Aparna, Y.-R.² Yoshihara, K.³

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