Practical expressions for the mean escape depth, the information depth, and the effective attenuation length in Auger-electron spectroscopy and x-ray photoelectron spectroscopy

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 27, Issue 2, 2009, Pages 253-261

  Jablonski, A ^a   Powell, C J ^b  

^a INSTITUTE OF PHYSICAL CHEMISTRY   (Poland)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC POTENTIALS; AUGER-ELECTRON SPECTROSCOPIES; EFFECTIVE ATTENUATION LENGTHS; ESCAPE DEPTHS; INELASTIC MEAN FREE PATHS; INFORMATION DEPTHS; LINEAR RELATIONS; SCATTERING CROSS SECTIONS; SINGLE-SCATTERING ALBEDOS; TRANSPORT MEAN FREE PATHS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

AUGERS; ELECTRONS; EMISSION SPECTROSCOPY; HAFNIUM; HAFNIUM COMPOUNDS; INORGANIC COMPOUNDS; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; SELF ASSEMBLED MONOLAYERS; SILVER; SPECTRUM ANALYSIS; TUNGSTEN COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIUM;

AUGER ELECTRON SPECTROSCOPY;

EID: 61449141054     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3071947     Document Type: Article

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