Inorganic block copolymer lithography

Polymer

Volumn 54, Issue 4, 2013, Pages 1269-1284

  Nunns, Adam ^a   Gwyther, Jessica ^a   Manners, Ian ^a  

^a UNIVERSITY OF BRISTOL   (United Kingdom)

Author keywords

Block copolymer; Lithography; Self assembly

Indexed keywords

ESTERS; FUNCTIONAL MATERIALS; LITHOGRAPHY; METAL NANOPARTICLES; SELF ASSEMBLY; SEMICONDUCTOR DEVICE MANUFACTURE;

BLOCK COPOLYMER LITHOGRAPHY; BLOCK COPOLYMER SELF-ASSEMBLY; DIRECT DEPOSITION; FLORY-HUGGINS INTERACTION PARAMETER; INORGANIC ELEMENTS; LITHOGRAPHIC PATTERNING; PATTERN TRANSFERS; SEMICONDUCTOR INDUSTRY;

BLOCK COPOLYMERS;

EID: 84873310282     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymer.2012.11.057     Document Type: Review

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