Polymers in conventional and alternative lithography for the fabrication of nanostructures

European Polymer Journal

Volumn 47, Issue 11, 2011, Pages 2033-2052

  Acikgoz, Canet ^a   Hempenius, Mark A ^a   Huskens, Jurriaan ^a   Vancso, G Julius ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

Alternative lithography; Colloidal assembly; Conventional lithography; Nanoimprint lithography; Patterning; Polymer resists

Indexed keywords

FABRICATION; NANOIMPRINT LITHOGRAPHY; NANOSTRUCTURES; POLYMERS;

COLLOIDAL ASSEMBLY; CONVENTIONAL LITHOGRAPHY; HIGH-RESOLUTION PATTERNING; NANOSTRUCTURED SURFACE; PATTERNING; POLYMER RESIST; RESIST MATERIALS; UNCONVENTIONAL LITHOGRAPHY;

LITHOGRAPHY;

EID: 80054709019     PISSN: 00143057     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.eurpolymj.2011.07.025     Document Type: Review

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