Square arrays of holes and dots patterned from a linear ABC triblock terpolymer

ACS Nano

Volumn 6, Issue 9, 2012, Pages 8342-8348

  Choi, Hong Kyoon ^a   Gwyther, Jessica ^b   Manners, Ian ^b   Ross, Caroline A ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b UNIVERSITY OF BRISTOL   (United Kingdom)

Author keywords

block copolymer; nanolithography; self assembly; solvent vapor annealing; square pattern; triblock terpolymer

Indexed keywords

ABC TRIBLOCK; BLOCK COPOLYMER LITHOGRAPHY; CHLOROFORM VAPOR; HOLE PATTERNS; NANO SCALE; PATTERN TRANSFERS; POLYFERROCENYLSILANES; SILICON SUBSTRATES; SOLVENT ANNEALING; SOLVENT VAPORS; SQUARE ARRAY; SQUARE PATTERNS; TRIBLOCK TERPOLYMERS;

ANNEALING; BLOCK COPOLYMERS; CHLORINE COMPOUNDS; HYDROSTATIC PRESSURE; NANOLITHOGRAPHY; ORGANIC SOLVENTS; POLYSTYRENES; SELF ASSEMBLY; SOLVENTS; VAPORS;

LITHOGRAPHY;

NANOMATERIAL; POLYMER;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; MOLECULAR IMPRINTING; PARTICLE SIZE; POROSITY; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; MOLECULAR IMPRINTING; NANOSTRUCTURES; PARTICLE SIZE; POLYMERS; POROSITY; SURFACE PROPERTIES;

EID: 84866642668     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn303085k     Document Type: Article

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