A simple pathway to ordered silica nanopattern from self-assembling of block copolymer containing organic silicon block

Applied Surface Science

Volumn 256, Issue 20, 2010, Pages 5843-5848

  Wang, Qi ^a   Yang, Jinghui ^a   Yao, Weiwei ^a   Wang, Ke ^a   Du, Rongni ^a   Zhang, Qin ^a   Chen, Feng ^a   Fu, Qiang ^a  

^a SICHUAN UNIVERSITY   (China)

Author keywords

Block copolymers; Self assembling; Silicon oxide

Indexed keywords

MICROCHANNELS; SELF ASSEMBLY; SILICA; SILICON OXIDES; SILICON WAFERS; STYRENE;

DIMETHYLSILOXANE; NANO-PATTERNED SURFACES; PATTERNING PROCESS; SELECTIVELY ETCHINGS; SELF-ASSEMBLING; SOLVENT-VAPOR ANNEALING; STRIPE PATTERN; TIME EVOLUTIONS;

BLOCK COPOLYMERS;

EID: 77953127519     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.03.057     Document Type: Article

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