Assembly of Sub-10-nm block copolymer patterns with mixed morphology and period using electron irradiation and solvent annealing

Nano Letters

Volumn 11, Issue 11, 2011, Pages 5079-5084

  Son, Jeong Gon ^a   Chang, Jae Byum ^a   Berggren, Karl K ^b   Ross, Caroline A ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEAL PROCESS; BLOCK COPOLYMER LITHOGRAPHY; BLOCK COPOLYMER SELF-ASSEMBLY; BLOCK COPOLYMER THIN FILMS; COMPLEX STRUCTURE; ELECTRON-BEAM IRRADIATIONS; LENGTH SCALE; LITHOGRAPHIC PATTERNING; MOLECULAR ARCHITECTURE; NANO-SCALE PATTERNS; PERIODIC PATTERN; SOLVENT ANNEALING;

BLOCK COPOLYMERS; COPOLYMERIZATION; ELECTRON IRRADIATION; MORPHOLOGY; PHOTOLITHOGRAPHY; SPHERES; STYRENE;

PLASTIC PRODUCTS;

NANOMATERIAL; POLYMER; SOLVENT;

ARTICLE; CHEMISTRY; CRYSTALLIZATION; ELECTRON; HARDNESS; MATERIALS TESTING; METHODOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; ELECTRONS; HARDNESS; MATERIALS TESTING; NANOSTRUCTURES; PARTICLE SIZE; POLYMERS; SOLVENTS; SURFACE PROPERTIES;

EID: 80755189347     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl203445h     Document Type: Article

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