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Volumn 11, Issue 10, 2011, Pages 4095-4101

Highly tunable self-assembled nanostructures from a poly(2-vinylpyridine- b -dimethylsiloxane) block copolymer

Author keywords

Block copolymers; nanolithography; polydimethylsiloxane; polyvinylpyridine; self assembly

Indexed keywords

2-VINYLPYRIDINE; BLOCK COPOLYMER FILMS; DIMETHYLSILOXANE; DIRECTED SELF-ASSEMBLY; INCOMPATIBLE BLOCKS; LINEAR FEATURE; MATRIX BLOCKS; MICRO-DOMAIN MORPHOLOGY; MICRO-DOMAINS; PATTERNED SUBSTRATES; POLY(2-VINYLPYRIDINE) (P2VP); POLYVINYLPYRIDINE; SELF ASSEMBLED NANOSTRUCTURES; SELF-ASSEMBLED; SOLVENT VAPORS; SWELLING RATIO; SYSTEMATIC CONTROL; TUNABILITIES;

EID: 80054025394     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl2016224     Document Type: Article
Times cited : (208)

References (45)
  • 27
  • 34
    • 0029308125 scopus 로고
    • Nose, T. Polymer 1995, 36 (11) 2243-2248
    • (1995) Polymer , vol.36 , Issue.11 , pp. 2243-2248
    • Nose, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.