The morphology and structure of PS-b-P4VP block copolymer films by solvent annealing: Effect of the solvent parameter

Polymers for Advanced Technologies

Volumn 22, Issue 6, 2011, Pages 915-923

  O'Driscoll, Sheena ^a,b   Demirel, G ^a   Farrell, Richard A ^a,b,c   Fitzgerald, Thomas G ^a,b   O'Mahony, Colm ^a,b   Holmes, Justin D ^a,b,c   Morris, Michael A ^a,b,c  

^a TRINITY COLLEGE DUBLIN   (Ireland)

^b UNIVERSITY COLLEGE CORK   (Ireland)

^c UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

Microphase separation; Polystyrene b poly(4 vinylpyridine); Solubility parameter; Solvent annealing

Indexed keywords

4-VINYLPYRIDINE; BLOCK COPOLYMER FILMS; CONTROL STRUCTURE; HILDEBRAND SOLUBILITY; LIQUID PHASE; MICROPHASE-SEPARATED STRUCTURE; NANOSTRUCTURED THIN FILM; POLYMER CHAINS; PS-B-P4VP; SILICON SUBSTRATES; SOLUBILITY PARAMETER; SOLVENT ANNEALING; SOLVENT PARAMETER; SURFACE ENERGIES; VAPOR PHASE METHODS;

ANNEALING; BLOCK COPOLYMERS; CASTING; COPOLYMERIZATION; MICROPHASE SEPARATION; MORPHOLOGY; POLYSTYRENES; SOLUBILITY; SOLVENTS; SUBSTRATES; SURFACE CHEMISTRY; TOLUENE;

ORGANIC SOLVENTS;

EID: 79955951672     PISSN: 10427147     EISSN: 10991581     Source Type: Journal    
DOI: 10.1002/pat.1596     Document Type: Article

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