Demagnification in proximity X-ray lithography and extensibility to 25 nm by optimizing Fresnel diffraction

Journal of Physics D: Applied Physics

Volumn 32, Issue 22, 1999, Pages

  Vladimirsky, Yuli ^a   Bourdillon, Antony ^a   Vladimirsky, Olga ^b,c   Jiang, Wenlong ^b   Leonard, Quinn ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b UNIVERSITY OF WISCONSIN MADISON   (United States)

^c SVGL   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FRESNEL DIFFRACTION; PHOTOELECTRON BLUR;

MASKS; MICROMACHINING; PHOTORESISTS; X RAY DIFFRACTION;

X RAY LITHOGRAPHY;

EID: 0033277045     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/32/22/102     Document Type: Article

References (10)

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3. Cerrina F 1997 X-Ray Lithography Handbook of Microlithography, Micromachining and Microfabrication ed P Rai-Choudhury (Washington: SPIE) vol 1 chapter 3 pp 253-319
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6. Ocola L E 1996 Electron-Matter Interactions in X-ray and Electron Beam Lithography PhD Thesis, University of Wisconsin-Madison
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10. Vladimirsky O, Dandekar N, Jiang W, Leonard Q, Simon K, Bollepalli S, Vladimirsky Y and Taylor J W 1999 Proc. SPIE conf. paper 92 vol 3676 pp 478-84