Robust block copolymer mask for nanopatterning polymer films

ACS Nano

Volumn 4, Issue 4, 2010, Pages 2088-2094

  Chao, Chia Cheng ^a   Wang, Tzu Chung ^a   Ho, Rong Ming ^a   Georgopanos, Prokopios ^b   Avgeropoulos, Apostolos ^b   Thomas, Edwin L ^c  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b UNIVERSITY OF IOANNINA   (Greece)

^c Massachusetts Institute of Technology   (United States)

Author keywords

Assembly; Nanostructures; Polymeric materials; Porous materials; Thin films

Indexed keywords

ETCHING SELECTIVITY; MICRO-DOMAINS; NANO CHANNELS; NANO PATTERN; NANOFABRICATION TECHNIQUES; NANOPATTERNING; NANOPOROUS THIN FILMS; NANOSTRUCTURED THIN FILM; OXIDIZATION; OXYGEN PLASMA TREATMENTS; OXYGEN REACTION; PATTERN TRANSFERS; POLYMERIC MATERIAL; POLYMERIC MATERIALS; SELF-ASSEMBLED;

BLOCK COPOLYMERS; CARBIDES; ETCHING; MICROCHANNELS; NANOSTRUCTURES; OXYGEN; PLASMA APPLICATIONS; POLYMERIC FILMS; POLYMERS; POLYSTYRENES; POROUS MATERIALS; SEMICONDUCTING SILICON COMPOUNDS; SILICONES; THIN FILMS;

POLYMER FILMS;

EID: 77951732662     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn901370g     Document Type: Article

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