Nanostructured thin films of organic-organometallic block copolymers: One-step lithography with poly(ferrocenylsilanes) by reactive ion etching

Advanced Materials

Volumn 12, Issue 2, 2000, Pages 98-103

  Lammertink, Rob G H ^a   Hempenius, Mark A ^a   Van Den Enk, Jan E ^b   Chan, Vanessa Z H ^c   Thomas, Edwin L ^c   Vancso, G Julius ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b AKZO NOBEL CENTRAL RESEARCH   (Netherlands)

^c Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; METALLORGANIC POLYMERS; MORPHOLOGY; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; POLYISOPRENES; POLYSILANES; REACTIVE ION ETCHING;

POLYFERROCENYLDIMETHYLSILANE;

PLASTIC FILMS;

EID: 0033639841     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-4095(200001)12:2<98::AID-ADMA98>3.0.CO;2-5     Document Type: Article

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