Ion energy distributions and efficiency of sputtering process in HIPIMS system

Journal of Physics D: Applied Physics

Volumn 41, Issue 11, 2008, Pages

  Burcalova, K ^a   Hecimovic, A ^b   Ehiasarian, A P ^b  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

^b SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; DEPOSITION; HIGH PRESSURE EFFECTS; MAGNETRON SPUTTERING; NIOBIUM;

ENERGY DISTRIBUTION; GAS PRESSURE; INDIVIDUAL IONS; ION FLUXES; MASS SPECTROSCOPY;

METALLIC FILMS;

EID: 44449120736     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/11/115306     Document Type: Article

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