Ion energy distributions in AZO magnetron sputtering from planar and rotatable magnetrons

Surface and Coatings Technology

Volumn 204, Issue 6-7, 2009, Pages 845-849

  Richter, F ^a   Welzel, T ^a   Kleinhempel, R ^a   Dunger, T ^a   Knoth, T ^b   Dimer, M ^b   Milde, F ^b  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

^b Von Ardenne Anlagentechnik GmbH   (Germany)

Author keywords

Ion energy distribution function (IEDF); Magnetron sputtering; Planar magnetron; Pulsed discharge; Rotatable magnetron

Indexed keywords

AVERAGE ENERGY; DISCHARGE POWER; GROUND POTENTIAL; HIGH ENERGY; HIGH-ENERGY IONS; INDUSTRIAL SCALE; ION ENERGY DISTRIBUTION FUNCTION (IEDF); ION ENERGY DISTRIBUTION FUNCTIONS; ION ENERGY DISTRIBUTIONS; ION MASS SPECTROMETER; LABORATORY SCALE; LOW-ENERGY PEAKS; OXYGEN ATMOSPHERE; PHYSICAL PROCESS; PLANAR MAGNETRON; PLASMA POTENTIAL; PULSED DISCHARGE; TARGET SURFACE; TARGET VOLTAGE; VERY HIGH ENERGIES; WORKING GAS;

ARGON; DISTRIBUTION FUNCTIONS; ELECTRIC POWER DISTRIBUTION; HIGH ENERGY PHYSICS; ION BEAMS; MAGNETRON SPUTTERING; MASS SPECTROMETRY; NEGATIVE IONS; OXYGEN; PLASMA SOURCES; TARGETS; ZINC; ZINC OXIDE;

MAGNETRONS;

EID: 71849112426     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.09.034     Document Type: Article

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