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Journal of Physics D: Applied Physics

Volumn 43, Issue 12, 2010, Pages

Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system

(4) Virostko, P a Hubicka Z a Cada M a Tichy M b

a INSTITUTE OF PHYSICS (Czech Republic)

b CHARLES UNIVERSITY (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTICAL MODEL; DC BIAS; DEPOSITION SYSTEMS; DISCHARGE CURRENTS; DUTY CYCLES; ION CURRENT DENSITY; ION CURRENTS; LOW PRESSURES; PULSED DC; PULSED DISCHARGE; REPETITION FREQUENCY; TIME EVOLUTIONS;

DEPOSITION; DIELECTRIC FILMS; IONS; PLASMA ACCELERATORS; PLASMA DEPOSITION; PLASMA JETS; PLASMA SOURCES; PROBES;

ELECTRIC DISCHARGES;

EID: 77949526965 PISSN: 00223727 EISSN: 13616463 Source Type: Journal
DOI: 10.1088/0022-3727/43/12/124019 Document Type: Article

Times cited : (5)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.