Physical properties of homogeneous TiO2 films prepared by high power impulse magnetron sputtering as a function of crystallographic phase and nanostructure

Journal of Physics D: Applied Physics

Volumn 42, Issue 10, 2009, Pages

  Straňák, Vítézslav ^a,b,c   Čada, Martin ^b   Quaas, Marion ^a   Block, Stephan ^a   Bogdanowicz, Robert ^d   Kment, Štěpán ^b   Wulff, Harm ^a   Hubička, Zdeněk ^b   Helm, Christiane A ^a   Tichý, Milan ^e   Hippler, Rainer ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b INSTITUTE OF PHYSICS   (Czech Republic)

^c UNIVERSITY OF SOUTH BOHEMIA   (Czech Republic)

^d GDANSK UNIVERSITY OF TECHNOLOGY   (Poland)

^e CHARLES UNIVERSITY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORBANCES; AMORPHOUS TIO; ANATASE FILMS; BAND GAP ENERGY; BULK PHASE; CRYSTALLOGRAPHIC PHASE; CRYSTALLOGRAPHIC PHASIS; CURRENT CONVERSION EFFICIENCY; DEPOSITION CHAMBERS; ELECTROCHEMICAL MEASUREMENTS; FILM COMPOSITION; GRAZING INCIDENCE X-RAY DIFFRACTOMETRY; HIGH-POWER; INPUT PARAMETER; LOW SUBSTRATE TEMPERATURE; MORPHOLOGICAL PROPERTIES; OPTICAL PARAMETER; PHOTON ENERGY; PLASMA PARAMETER; POST-DEPOSITION; POWER DENSITIES; PROBE MEASUREMENTS; RUTILE AND ANATASE; THERMAL-ANNEALING; TIME-RESOLVED; TIO;

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CALORIMETRY; CONVERSION EFFICIENCY; DEPOSITION; ELECTROCHEMICAL PROPERTIES; LANGMUIR PROBES; MAGNETRONS; ORGANIC POLYMERS; OXIDE MINERALS; PHOTONS; PROBES; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY; TITANIUM DIOXIDE; TITANIUM OXIDES; X RAY DIFFRACTION ANALYSIS;

FILM PREPARATION;

EID: 70249146541     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/10/105204     Document Type: Article

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