Plasma drift in dual magnetron discharge

IEEE Transactions on Plasma Science

Volumn 36, Issue 4 PART 1, 2008, Pages 1412-1413

  Baroch, Pavel ^a   Musil, Jindrich ^a  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

Dual magnetron (DM); Magnetic field; Plasma discharge; Plasma drift

Indexed keywords

DISCHARGE (FLUID MECHANICS); MAGNETIC FIELD MEASUREMENT; MAGNETIC FIELDS; MAGNETRONS; PLASMAS;

DUAL MAGNETRON; DUAL MAGNETRON (DM); MAGNETIC FIELD; MAGNETIC-FIELD LINES; PLANE-OF-SYMMETRY; PLASMA DISCHARGE; PLASMA DRIFT; PLASMA DRIFTS; PLASMA SCIENCE;

ELECTRIC DISCHARGES;

EID: 50249095764     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2008.924483     Document Type: Article

References (4)

1. J. Musil, P. Baroch, J. Vlček, K. H. Nam, and J. G. Han, "Reactive magnetron sputtering of thin films: Present status and trends," Thin Solid Films, vol. 475, no. 1/2, pp. 208-218, Mar. 2005.
2. J. Musil and P. Baroch, "Discharge in dual magnetron sputtering system," IEEE Trans. Plasma Sci., vol. 33, no. 2, pp. 338-339, Apr. 2005.
3. D. A. Frank-Kameneckii, Lectures on Plasma Physics. Moskva, Russia: Atomizdat, 1964, p. 90. (in Russian).
4. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Material Processing. New York: Wiley, 1994, p. 105.