Formation of TiOx films produced by high-power pulsed magnetron sputtering

Journal of Physics D: Applied Physics

Volumn 41, Issue 5, 2008, Pages

  Straák, Vítzslav ^a,b   Quaas, Marion ^a   Wulff, Harm ^a   Hubika, Zdenk ^b   Wrehde, Stefan ^a   Tichý, Milan ^c   Hippler, Rainer ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b INSTITUTE OF PHYSICS   (Czech Republic)

^c CHARLES UNIVERSITY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; ELECTRIC DISCHARGES; MAGNETRON SPUTTERING; SPUTTER DEPOSITION; TITANIUM OXIDES; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

DISCHARGE CURRENT; GRAZING INCIDENCE X-RAY DIFFRACTOMETRY; PULSED PLANAR MAGNETRON SPUTTERING DEPOSITION; VACUUM CHAMBERS;

OXIDE FILMS;

EID: 42549165604     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/5/055202     Document Type: Article

References (25)

1. Andersson A 1959 Acta Chem. Scand. 13 415
2. Homberg B 1962 Acta Chem. Scand. 16 1245
3. Loehman R E, Rao C N R and Honig J M 1969 J. Phys. Chem. 73 1781
4. Herman D, Sicha J and Musil J 2006 Vacuum 81 258
5. Martin N, Russelot C, Rondot D, Palmino F and Mercier R 1997 Thin Solid Films 300 113
6. Musil J, Herman D and Sicha J 2006 J. Vac. Sci. Technol. A 24 521
7. Bendavid A, Martin P J and Takikawa H 2000 Thin Solid Films 360 241
8. Han Y H, Jung S J and Lee J J 2007 Surf. Coat. Sci. Technol. 201 5387
9. Park B, Jung D-H, Lee G, Lee J-J and Joo J-H 2003 Surf. Coat. Sci. Technol. 174-175 634
10. Kouznetsov V, Macak K, Schneider J M, Helmersson U and Petrov I 1999 Surf. Coat. Technol. 122 290
11. Mack K, Kouznetsov V, Schneider J M and Helmersson U 2000 J. Vac. Sci. Technol. A 18 1533
12. Gudmundsson J T, Alami J and Helmersson U 2001 Appl. Phys. Lett. 78 3427
13. Konstantinidis S, Dauchot J P and Hecq M 2006 Thin Solid Films 515 1182
14. Bohlmark J et al 1997 Thin Solid Films 300 1522
15. Konstantinidis S, Dauchot J P, Ganciu M and Hecq M 2006 Appl. Phys. Lett. 88 021501
16. Wulff H and Steffen H 2001 Characterisation of thin films Low Temperature Plasma Physics ed R Hippler et al (New York: Wiley-VCH) p 253
17. Safi I 2000 Surf. Coat. Technol. 127 203
18. Depla D, Heirwegh S, Mahieu S and De Gryse R 2007 J. Appl. Phys. 101 13301
19. Phelps A V and Petrovic Z Lj 1999 Plasma Sources Sci. Technol. 8 R21
20. Wittmaack K 1999 Surf. Sci. 419 249
21. Martin N, Baretti D, Rousselot C and Rauch J-Y 1998 Surf. Coat. Technol. 107 172
22. Garcia-Rosales C, Eckstein W and Roth J 1994 J. Nucl. Mater. 218 8
23. Tiron V, Vitelaru C, Soloman M, Tufescu F M and Popa G 2007 J. Optoelectron. Adv. Mater. 8 66
24. Stranak V et al 2006 Surf. Coat. Technol. 201 2512
25. Schiller S, Heisig U, Steinfelder K and Strumpfel J 1979 Thin Solid Films 63 369