Measurement of energy transfer at an isolated substrate in a pulsed dc magnetron discharge

Journal of Applied Physics

Volumn 102, Issue 6, 2007, Pages

  Cada M ^a,c   Bradley, J W ^a   Clarke, G C B ^b   Kelly, P J ^b  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

^b MANCHESTER METROPOLITAN UNIVERSITY   (United Kingdom)

^c INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

CALORIMETERS; ENERGY TRANSFER; LANGMUIR PROBES; MAGNETRON SPUTTERING; PLASMA SOURCES; SUBSTRATES;

CALORIMETER PROBES; POWER DENSITY; PULSED MAGNETRON DISCHARGE; TIME-RESOLVED LANGMUIR MEASUREMENTS;

ELECTRICAL ENGINEERING;

EID: 34848905330     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2779287     Document Type: Article

References (36)

1. W. D. Westwood, in Physics of Thin Films, edited by, M. H. Francombe, and, J. L. Vossen, (Academic, Boston, 1989), pp. 1-79.
2. S. Schiller, U. Heisig, C. Korndorfer, G. Beister, J. Reschke, K. Steinfelder, and J. Strumpfel, Surf. Coat. Technol. 33, 405 (1987).
3. J. Szczyrbowski and C. Braatz, Proc. SPIE 1727, 122 (1992).
4. I. Safi, Surf. Coat. Technol. 127, 203 (2000).
5. S. Schiller, K. Goedicke, J. Reschke, V. Kirchhoff, S. Schneider, and F. Milde, Surf. Coat. Technol. 61, 331 (1993).
6. J. M. Schneider and W. D. Sproul, in Handbook of Thin Film Processing Technology, edited by, D. A. Glocker, and, S. I. Shah, (IOP, Bristol, 1998), Vol. A.5:1.
7. G. Este and W. D. Westwood, J. Vac. Sci. Technol. A 6, 1845 (1988).
8. W. D. Sproul, Vacuum 51, 641 (1998).
9. A. Belkind, A. Freilich, and R. Scholl, J. Vac. Sci. Technol. A 17, 1934 (1999).
10. M. E. Graham and W. D. Sproul, Proceedings of the 37th SVC Annual Technical Conference, SVC, Albuquerque, NM, 1994, pp. 275.
11. H. Kersten, H. Deutsch, H. Steffen, G. M. W. Kroesen, and R. Hippler, J. Vac. Sci. Technol. A 63, 385 (2001).
12. R. Wendt, K. Ellmer, and K. Wiesemann, J. Appl. Phys. 82, 2115 (1997).
13. D. A. Glocker, J. Vac. Sci. Technol. A 11, 2989 (1993).
14. S. D. Ekpe and S. K. Dew, J. Vac. Sci. Technol. A 20, 1877 (2002).
15. H. Kersten, E. Stoffels, W. W. Stoffels, M. Otte, C. Csambal, H. Deutsch, and R. Hippler, J. Appl. Phys. 87, 3637 (2000).
16. H. Kersten, H. Steffen, D. Vender, and H. E. Wagner, Vacuum 46, 305 (1995).
17. H. Kersten, D. Rohde, J. Berndt, H. Deutsch, and R. Hippler, Thin Solid Films 378, 585 (2000).
18. H. Kersten, H. Deutsch, and J. F. Behnke, Vacuum 48, 123 (1997).
19. D. Rohde, P. Pecher, H. Kester, W. Jacob, and R. Hippler, Surf. Coat. Technol. 149, 206 (2002).
20. E. Stoffels, R. E. J. Sladek, I. E. Kieft, H. Kersten, and R. Wiese, Plasma Phys. Controlled Fusion 46, B167 (2004).
21. L. J. Mahoney, G. W. McDonough, D. C. Carter, G. A. Roche, and H. V. Valde, Proceedings of the 46th International AVS Symposium, Seattle, USA, 25-29 October, 1999.
22. J. W. Bradley, H. Backer, Y. Aranda-Gonzalvo, P. J. Kelly, and R. D. Arnell, Plasma Sources Sci. Technol. 11, 165 (2002).
23. I. Swindells, P. J. Kelly, and J. W. Bradley, New J. Phys. 8, 47 (2006).
24. J. A. Thornton, Thin Solid Films 54, 23 (1978).
25. M. Andritschky, F. Guimaraes, and V. Teixeira, Vacuum 44, 809 (1993).
26. F. F. Chen, in Plasma Diagnostics Technique, edited by, R. H. Huddlestone, and, S. L. Leonard, (Academic, New York, 1965), pp. 134-135.
27. S. Pfau and M. Tich, in Low Temperature Plasma Physics: Fundamental Aspects and Applications, edited by, R. Hippler, H. Kersten, M. Schmidt, and, K. H. Schoenback, (Wiley-VCH, Berlin, 2001), pp. 131-172.
28. T. Moiseev and D. C. Cameron, Surf. Coat. Technol. 200, 5306 (2005).
29. R. Piejak, V. Godyak, B. Alexandrovich, and N. Tishchenko, Plasma Sources Sci. Technol. 7, 590 (1998).
30. Y. Yamamura and H. Tawara, At. Data Nucl. Data Tables 62, 149 (1996).
31. R. A. Baragiola, E. V. Alonso, J. Ferron, and A. Oliva-Florio, Surf. Sci. 90, 240 (1979).
32. Y. Lin and D. C. Joy, Surf. Interface Anal. 37, 895 (2005).
33. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Material Processing (Wiley, New York, 1994), pp. 53-55.
34. K. Meyer, I. K. Schuller, and C. M. Falco, J. Appl. Phys. 52, 5803 (1981).
35. W. Eckstein and J. P. Biersack, Z. Phys. B: Condens. Matter 63, 471 (1986).
36. P. J. Kelly, M. Audronis, A. A. Onifade, Y. Zhou, and J. W. Bradley, Proceedings of the Tenth International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, 10-15 September, 2006.