Pulse duration effects in pulse-power reactive sputtering of Al2O3

Surface and Coatings Technology

Volumn 108-109, Issue , 1998, Pages 558-563

  Belkind, A ^a   Freilich, A ^a   Scholl, R ^b  

^a STEVENS INSTITUTE OF TECHNOLOGY   (United States)

^b NONE

Author keywords

Alumina; Arcing; Dielectrics; Pulsed power; Reactive sputtering

Indexed keywords

ALUMINA; DIELECTRIC FILMS; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; MAGNETRONS; PLASMAS;

PULSE-POWER REACTIVE MAGNETRON SPUTTERING;

MAGNETRON SPUTTERING;

EID: 0032182861     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00635-5     Document Type: Article

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