Fundamental proximity effects in focused electron beam induced deposition

ACS Nano

Volumn 6, Issue 1, 2012, Pages 286-294

  Plank, Harald ^a,b   Smith, Daryl A ^c   Haber, Thomas ^b   Rack, Philip D ^c,d   Hofer, Ferdinand ^a,b  

^a GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^b Center for Electron Microscopy   (Austria)

^c University of Tennessee Knoxville   (United States)

^d OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

electron beam induced deposition; Monte Carlo simulation; nanotechnology; patterning; platinum

Indexed keywords

ADJACENT FEATURE; BACK-SCATTERED; DEPLETION EFFECTS; DIRECT WRITE; DIRECT-WRITE TECHNIQUE; ELECTRON BEAM-INDUCED DEPOSITION; FOCUSED ELECTRON BEAM INDUCED DEPOSITION; MONTE CARLO SIMULATION; NANO SCALE; PATTERNING; PROXIMITY EFFECTS; SCANNING ELECTRONS; SECONDARY ELECTRONS; SPECIFIC EFFECTS; VOLUMETRIC GROWTH;

COMPUTER SIMULATION; ELECTRON BEAMS; FORWARD SCATTERING; GROWTH RATE; MONTE CARLO METHODS; NANOTECHNOLOGY; PLATINUM;

ELECTRONS;

HEAVY ION; NANOMATERIAL;

ARTICLE; CHEMICAL MODEL; CHEMISTRY; COMPUTER SIMULATION; CONFORMATION; CRYSTALLIZATION; ELECTRON; ELECTROPLATING INDUSTRY; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; PARTICLE SIZE; RADIATION EXPOSURE; SURFACE PROPERTY;

COMPUTER SIMULATION; CRYSTALLIZATION; ELECTRONS; ELECTROPLATING; HEAVY IONS; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MODELS, CHEMICAL; MOLECULAR CONFORMATION; NANOSTRUCTURES; PARTICLE SIZE; SURFACE PROPERTIES;

EID: 84856170951     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn204237h     Document Type: Article

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