An optimized nanoparticle separator enabled by electron beam induced deposition

Nanotechnology

Volumn 21, Issue 16, 2010, Pages

  Fowlkes, J D ^a   Doktycz, M J ^a   Rack, P D ^a,b  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b University of Tennessee   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

3-D ENVIRONMENTS; DIRECT WRITE; ELECTRON BEAM-INDUCED DEPOSITION; GROWTH EFFICIENCY; INTERACTION REGION; LINEAR ARRAYS; MEMBRANE COMPONENTS; NANO SCALE; NANOFABRICATION; NANOFABRICATION TECHNIQUES; NANOPILLAR; NANOPILLARS; NANOSCALE FEATURES; PARAXIAL; PROXIMITY EFFECTS; SUB-50 NM; TRANSAXIAL;

ELECTRON BEAMS; NANOSTRUCTURED MATERIALS; SEPARATORS;

NANOPARTICLES;

NANOMATERIAL;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; ELECTRON; ELECTROPLATING INDUSTRY; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; MICROMANIPULATION; NANOTECHNOLOGY; PARTICLE SIZE; RADIATION EXPOSURE; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; ELECTRONS; ELECTROPLATING; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MICROMANIPULATION; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTIES;

EID: 77950481064     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/16/165303     Document Type: Article

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