Simulating the effects of surface diffusion on electron beam induced deposition via a three-dimensional Monte Carlo simulation

Nanotechnology

Volumn 19, Issue 41, 2008, Pages

  Smith, Daryl A ^a   Fowlkes, Jason D ^b   Rack, Philip D ^a,b  

^a University of Tennessee Knoxville   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMS; DIFFUSION; DIFFUSION IN SOLIDS; ELECTRIC WIRE; ELECTRON BEAMS; ELECTRON GUNS; GAS ADSORPTION; GASES; MONTE CARLO METHODS; MOSFET DEVICES; PARTICLE BEAMS; RATE CONSTANTS; REACTION RATES; SEMICONDUCTOR DOPING; THEOREM PROVING; THREE DIMENSIONAL;

BACKSCATTERED ELECTRONS; DEPOSITION CONDITIONS; DIFFUSION COEFFICIENTS; DIFFUSION LENGTHS; GAS PHASE ADSORPTIONS; INDUCED DEPOSITIONS; LATERAL GROWTH RATES; MASS TRANSPORTS; MONTE CARLO SIMULATIONS; SIDE-WALLS; VERTICAL GROWTHS;

SURFACE DIFFUSION;

NANOWIRE;

ARTICLE; DIFFUSION; ELECTRON BEAM; MONTE CARLO METHOD; PRIORITY JOURNAL; SIMULATION; SURFACE PROPERTY;

EID: 56349109954     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/41/415704     Document Type: Article

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