On the influence of environment gases, relative humidity and gas purification on dielectric charging/discharging processes in electrostatically driven MEMS/NEMS devices

Nanotechnology

Volumn 22, Issue 3, 2011, Pages

  Zaghloul, U ^a,b,c   Bhushan, B ^c   Pons, P ^a,b   Papaioannou, G J ^a,b,d   Coccetti, F ^a,b   Plana, R ^a,b  

^a LAAS CNRS   (France)

^b INSA   (France)

^c OHIO STATE UNIVERSITY   (United States)

^d UNIVERSITY OF ATHENS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPES; CAPACITIVE RF MEMS SWITCH; CHARGING/DISCHARGING; DIELECTRIC CHARGING; DISCHARGING PROCESS; ELECTROSTATICALLY DRIVEN; ENVIRONMENTAL CONDITIONS; GAS PURIFICATION; GAS PURIFIER; GOOD CORRELATIONS; KELVIN PROBE FORCE MICROSCOPY; MEMS SWITCHES; MEMS/NEMS; NANO ELECTROMECHANICAL SYSTEMS; NANO SCALE; NITROGEN ENVIRONMENT; OPERATING ENVIRONMENT; OXYGEN GAS; RELATIVE HUMIDITIES; SILICON NITRIDE FILM; SURFACE POTENTIAL MEASUREMENTS; VOLTAGE PULSE;

AIR CLEANERS; ATMOSPHERIC HUMIDITY; ELECTRIC SWITCHES; ELECTROMECHANICAL DEVICES; ELECTROSTATIC ACTUATORS; GASES; HYDROCARBON REFINING; HYDROCARBONS; OXYGEN; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PURIFICATION; SILICON NITRIDE; SURFACE POTENTIAL; SURFACE PROPERTIES;

NITROGEN;

EID: 79251544567     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/3/035705     Document Type: Article

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