Surface potential mapping: A qualitative material contrast in SPM

Ultramicroscopy

Volumn 69, Issue 1, 1997, Pages 39-49

  Jacobs, H O ^a   Knapp, H F ^a   Muller S ^a   Stemmer, A ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

AFM; Chemical contrast; Contact potential; Kelvin probe; SPM; Surface potential

Indexed keywords

COMPUTER SIMULATION; METALS; SEMICONDUCTOR MATERIALS; SURFACE DISCHARGES; VOLTAGE DISTRIBUTION MEASUREMENT;

CHEMICAL CONTRAST; CONTACT POTENTIAL; KELVIN PROBE; POTENTIAL RESOLUTION; SCANNING PROBE MICROSCOPE; SURFACE POTENTIAL MAPPING;

ATOMIC FORCE MICROSCOPY;

ARTICLE; ELECTRIC POTENTIAL; IMAGE ANALYSIS; SEMICONDUCTOR; SIGNAL NOISE RATIO;

EID: 0342618427     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-3991(97)00027-2     Document Type: Article

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