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Volumn , Issue , 2007, Pages 579-582

Si3N4 thin films proprerties for RF-MEMS reliability investigation

Author keywords

Charge and discharging processes; Charge imaging by atomic force microscopy; Dielectric charging; Failure modes and mechanisms; FTIR; Micro switches; Reliability; RF MEMS

Indexed keywords

ACTUATORS; ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; FINANCE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IMAGING TECHNIQUES; MECHANISMS; MICROSCOPIC EXAMINATION; MICROSYSTEMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; QUANTUM CHEMISTRY; SCANNING PROBE MICROSCOPY; SENSORS; THICK FILMS; THIN FILMS; TRANSDUCERS;

EID: 50049125331     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SENSOR.2007.4300196     Document Type: Conference Paper
Times cited : (14)

References (5)
  • 2
    • 33748494480 scopus 로고    scopus 로고
    • Effect of space charge polarization in radio frequency micro-electro- mechanical system capacitive switch dielectric charging
    • Sept
    • G. J. Papaioannou and al., "Effect of space charge polarization in radio frequency micro-electro- mechanical system capacitive switch dielectric charging" Appl. Phys. Lett. 89, 103512 (Sept 2006).
    • (2006) Appl. Phys. Lett , vol.89 , pp. 103512
    • Papaioannou, G.J.1    and al2
  • 3
    • 33747756123 scopus 로고    scopus 로고
    • Charging-Effects in RF Capacitive Switches Influence of insulating layers composition
    • M. Lamhamdi and al., "Charging-Effects in RF Capacitive Switches Influence of insulating layers composition "Microelectronics Reliability 46 (2006) 1700-1704
    • (2006) Microelectronics Reliability , vol.46 , pp. 1700-1704
    • Lamhamdi, M.1    and al2
  • 4
    • 0000513694 scopus 로고    scopus 로고
    • G. N. Parsons and al., Low hydrogen content stoichiometric silicon nitride films deposited by plasma-enhanced chemical vapour deposition J. Appl. Phys., 70 (3), 1 August 1991, 125 pp 1553-1560.
    • G. N. Parsons and al., "Low hydrogen content stoichiometric silicon nitride films deposited by plasma-enhanced chemical vapour deposition" J. Appl. Phys., 70 (3), 1 August 1991, 125 pp 1553-1560.
  • 5
    • 0041336846 scopus 로고    scopus 로고
    • Detection of electrostatic forces with an atomic force microscope: Analytical and experiment dynamic force curves in the nonlinear regime
    • July
    • R.Dianoux and al., Detection of electrostatic forces with an atomic force microscope: Analytical and experiment dynamic force curves in the nonlinear regime. PHYSICAL REVIEW B 68; 045403 (July 2003).
    • (2003) PHYSICAL REVIEW B , vol.68 , pp. 045403
    • Dianoux, R.1    and al2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.