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Journal of Vacuum Science and Technology B

Volumn 28, Issue 3, 2010, Pages 527-537

Atomic radical abatement of organic impurities from electron beam deposited metallic structures

(6) Wnuk, Joshua D a Gorham, Justin M a Rosenberg, Samantha G a Madey, Theodore E b Hagen, Cornelis W c Fairbrother, D Howard a

a JOHNS HOPKINS UNIVERSITY (United States)

b RUTGERS UNIVERSITY (United States)

c DELFT UNIVERSITY OF TECHNOLOGY (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; CARBON; ELECTRON IRRADIATION; ELECTRONS; GOLD COMPOUNDS; GOLD DEPOSITS; IMPURITIES; METALS; NANOSTRUCTURES; ORGANOMETALLICS; OXYGEN; PARTICLE SIZE; PARTICLE SIZE ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC HYDROGEN; ATOMIC OXYGEN; ATOMIC-FORCE-MICROSCOPY; ELECTRON-BEAM; FOCUSED ELECTRON BEAMS; GOLD CONTAINING; METALLIC STRUCTURES; ORGANIC IMPURITIES; ORGANOMETALLIC PRECURSORS; X-RAY PHOTOELECTRONS;

DEPOSITS;

EID: 77952961265 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3378142 Document Type: Conference Paper

Times cited : (10)

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